Engineered to satisfy stringent Japanese Industrial Standards (JIS R3204) and ISO Class 3 cleanroom handling requirements. High transmittance across deep UV (185nm) to mid-infrared (3500nm) spectrums.
Ozone-free welding, thermal resistance up to 1300°C, designed for rapid thermal processing (RTP) and selective infrared emitters.
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Precision vacuum bending and fusion welding. Structural stability under high vacuum gradients in chemical vapor deposition processes.
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Accurate mechanical pitch moulding, cold laser cutting, and stress-relieved annealed joints for complex fluid heat exchangers.
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Laser drilled, fire-polished, high OH-content or OH-free formulations engineered for photolytic sterilizers and spectroscopic sensors.
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JGS1 equivalent synthetic silica core with 99.999% purity. Optimized total internal reflection with minimal beam dispersion.
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Ultra-flat lapping (surface roughness Ra < 0.5nm). Zero diffuse scattering background tailored for crystalline diffractive analysis.
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Precision flange connections, chemical resistance against aggressive acids, optimized for high-temperature synthesis laboratories.
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Rigid geometric wall tolerance, certified heavy metal bubble free inclusions, specialized for epitaxial growth and oxidation lines.
Product Details →A multi-dimensional audit cross-referencing surface planarity (λ/10 to λ/20), laser damage threshold (LDT), dimensional CNC tolerances (±0.005 mm), and Hanshin supply chain accessibility.
The manufacturing ecosystem of Kobe and the broader Kansai area—anchored by biomedical pioneers on Port Island (Kobe Biomedical Innovation Cluster - KBIC), optical component developers in Nishi-ku, and maritime robotics centers—demands exceptional purity and zero internal inclusions in fused silica components. When selecting a precision supplier, engineering teams evaluate raw crystalline provenance, hot flame annealing consistency, and CNC ultrasonic machining tolerances.
| Supplier Name | Primary Production Focus | Material Purity / Optical Grade | Machining Capabilities | Kobe Logistics Lead Time |
|---|---|---|---|---|
| Zunex Quartz Products Co., Ltd. | Custom Fused Quartz Plates, Wafers, Multi-bore Tubes | JGS1 (DUV), JGS2 (UV-VIS), JGS3 (IR) ≥99.99% | Laser micro-drilling, CNC ultrasonic milling, λ/10 double-side lap | 3-5 Days (Express Door-to-Door to Kobe/Osaka) |
| Tosoh Quartz Corporation | Semiconductor Quartzware, Photomask Substrates | Synthetic Fused Silica, Ultra-Low OH Content | Large-aperture CNC grinding, automated cleanroom fabrication | Local Domestic Stock / 2-4 Weeks Custom |
| Shin-Etsu Quartz Products Co., Ltd. | Synthetic Quartz Ingots, Optical Preforms | Extreme UV Lithography (EUV) Grade | High-purity chemical etching, ultra-flat double-sided polish | Domestic Kansai Distribution Hub |
| Nikon Corporation (Specialty Glass) | Synthetic Silica Optical Windows, Laser Elements | Deep-UV Grade Silica (Excimer-rated) | Wavefront interferometry-guided CNC corrective polishing | Production Lead Time: 4-6 Weeks |
| AGC Inc. (Fine Glass Division) | Optoelectronic Substrates, Synthetic Quartz | Synthetic Fused Silica with High LDT | Precision slicing, chamfering, thin-wafer chemical polishing | Domestic Hub / 1-2 Weeks Expedited |
| Heraeus Conamic Japan | Base Material Ingots, Diffusion Tubes, Plates | Suprasil, Infrasil, Homosil optical quartz | Large-format wafer slicing, flame restructuring | Regional Delivery: 1-3 Weeks |
| Sumita Optical Glass, Inc. | High-refraction lenses, Custom Optical Windows | Precision Functional Optical Glass & Quartz | Precision glass molding, CNC lens profiling | Domestic Dispatch: 2-3 Weeks |
| Ohara Inc. | Low-expansion ceramics, Substrate Plates | High transmission quartz-like ceramics | High-precision optical lapping (pitch polishing) | Domestic Kansai Route: 1-2 Weeks |
| Taiyo Nippon Sanso (Optics Division) | Gas-treated quartz reactors, Optical Cell Plates | High thermal stability fused quartz | Precision quartz pipe welding, burner flame annealing | Domestic Hub: 7-10 Days |
| Kanto Quartz Corporation | Semiconductor cleaning baths, Quartz trays | Standard Electronic & Solar Grade Silica | Bending, cutting, fire polishing, acid leaching | Domestic: 2-3 Weeks |
Technical Procurement Takeaway: While domestic Japanese manufacturers maintain strong localized stock for standardized wafer dimensions, Zunex Quartz delivers a distinctive advantage for R&D institutes and bespoke system developers in Kobe. By combining high-purity Donghai crystalline feedstocks with in-house laser micro-drilling, specialized grooving, and direct-to-engineer drawing evaluations (≤2 hour turnaround), custom non-standard orders bypass domestic 6-to-8-week retooling delays.
Bridging synthetic fused silica performance with mission-critical applications across Hyogo's advanced manufacturing hubs.
The Kobe Biomedical Innovation Cluster relies on ultra-pure JGS1 quartz optical plates for laser-induced fluorescence (LIF) microfluidic chips. Zero bubble inclusion (DIN 3140-1) and high transmittance at 266nm–355nm ensure uncompromised single-cell detection fidelity.
Supporting offshore robotics operating from Kobe Port. Double-side polished quartz plates exhibit 1100 MPa compressive strength, zero micro-fracturing along CNC bevels, and verified structural integrity in high-salinity marine submersibles.
With Wide Bandgap (WBG) power semiconductors ramping up in Osaka Bay and Harima, our quartz reaction tubes and wafer holders withstand sustained thermal profiles above 1150°C without recrystallization (devitrification) or metallic outgassing.
Structural shifts transforming how Japanese optical engineers specify fused silica and quartz optical plates.
1. Migration Toward Cold Laser Machining (Pico/Femtosecond Ablation): Traditional ultrasonic grinding on fragile quartz plates often introduces subsurface micro-cracks measuring 10–30 μm deep. In Kobe's advanced photonics laboratories, femtosecond laser processing now provides damage-free edge rounding and micro-hole arrays with roughness Ra < 0.2 μm, eliminating brittle fracture points under high thermal cycling.
2. Low-Hydroxyl (<1 ppm OH) Synthetic Silica for Mid-IR Sensing: Driven by green hydrogen infrastructure projects along Kobe's Waterfront (such as liquefied hydrogen monitoring sensors), the demand for JGS3 infrared-grade optical quartz has surged. Standard silica exhibits a strong absorption dip around 2730nm due to OH vibration; specialized vacuum electric-fused quartz eliminates this band completely.
3. Extreme Homogeneity & Zero Striae for DUV Lithography: The miniaturization of precision optics requires refractive index homogeneity Δn across the substrate to stay within ±1×10⁻⁶. Rigorous thermal stress annealing guarantees stress birefringence below 2 nm/cm, crucial for high-numerical-aperture UV illumination systems.
Select your optical substrate with verified physical and chemical metrics.
| Parameter / Metric | JGS1 (Synthetic Fused Silica) | JGS2 (Optical Fused Quartz) | JGS3 (Infrared Fused Quartz) |
|---|---|---|---|
| Optical Transmittance Band | 185 nm – 2,500 nm (Deep UV) | 220 nm – 2,500 nm (UV-Visible) | 260 nm – 3,500 nm (Near-to-Mid IR) |
| Hydroxyl Content ([OH‾]) | Typical: 800 – 1200 ppm | Typical: 150 – 200 ppm | ≤ 2 ppm (Low OH Formulation) |
| Purity (SiO₂ wt %) | ≥ 99.999% | ≥ 99.99% | ≥ 99.99% |
| Refractive Index (nd @ 587.6 nm) | 1.4584 | 1.4585 | 1.4585 |
| Thermal Expansion (0–300 °C) | 5.5 × 10⁻⁷ K⁻¹ | 5.5 × 10⁻⁷ K⁻¹ | 5.5 × 10⁻⁷ K⁻¹ |
| Softening / Strain Point | 1600 °C / 1070 °C | 1683 °C / 1120 °C | 1720 °C / 1180 °C |
Key technical concerns addressed by our senior glass fabrication engineers.
Submit your DXF, DWG, PDF, or STEP files to our engineering group. Receive a comprehensive manufacturability assessment, tolerance verification, and competitive FOB/CIF Kobe pricing in 2 hours or less.
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